Journal article
Vacuum-Free Liquid-Metal-Printed 2D Semiconducting Tin Dioxide: The Effect of Annealing
Nitu Syed, Chung Kim Nguyen, Ali Zavabeti, Mei Xian Low, Xiaotian Wei, Vaishnavi Krishnamurthi, Mehmood Irfan, Wendy SL Lee, Ngoc MH Duong, Anh Thai Nguyen, Philipp Reineck, Lei Bao, Ann Roberts, Torben Daeneke
ACS Applied Electronic Materials | American Chemical Society | Published : 2024
Abstract
Thin film transistors (TFTs) offer unparalleled opportunities for the fabrication of multifunctional electronic and optoelectronic devices. In this work, we report a vacuum-free liquid metal exfoliation technique for rapidly printing ∼2 nm-thick layer of oxide from molten tin. We explore the effect of rapid thermal annealing at 450 °C on the stoichiometry, morphology, and crystal structure of the resulting tin oxide nanosheets. The annealed samples exhibit a dominant SnO2 phase and a high degree of transparency (>99%) in the visible spectra. Field-effect transistors based on the two-dimensional (2D) SnO2 films show typical n-channel conduction with a field-effect mobility of ∼7.5 cm2 V–1 s–1..
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Grants
Awarded by McKenzie Postdoctoral Fellowship from the University of Melbourne
Awarded by VNU-HCM
Awarded by RMIT University
Funding Acknowledgements
N.S. recognizes the support of a McKenzie Postdoctoral Fellowship from the University of Melbourne. T.D. and C.K.N. acknowledge funding received from the Australian Research Council's (ARC) DECRA program (DE190100100). C.K.N. and A.T.N. acknowledge Ho Chi Minh City University of Technology (HCMUT), VNU-HCM for supporting this study. P.R. acknowledges support through an Australian Research Council DECRA Fellowship (grant no. DE200100279) and an RMIT University Vice-Chancellor's Senior Research Fellowship. A.R. acknowledges support through ARC Centre of Excellence for Transformative Meta-Optical Systems (project number CE200100010). The authors would also like to thank the RMIT Microscopy and Microanalysis Facility (RMMF) and the Micro Nano Research Facility (MNRF).